The technical articles listed here provide information about the products and processes offered by Akrion Systems. They are collected from presentations made at technical conferences and from articles published in industry newsletters and magazines.
- How to Overcome the Effects of Silicon Build-up during Solar Cell Wet Processing (UCPSS2012)
- Optimized Wet Processes and PECVD for High Efficiency Solar Cells (UCPSS2012)
- CO2-Dissolved Water Cleans for 2x-nm Silicon Devices in a Single Wafer Megasonic System (UCPSS2012)
- Advanced Process Control of Chemical Concentration for Solar Cell Manufacturing (IEEE2012)
- Advanced Process Control of Chemical Concentration for Solar Cell Manufacturing
(EUPVSEC 2011) - Characterization of c-Si Texturization in Wet KOH/IPA and its Effect on Cell Efficiency (EUPVSEC 2011)
- Improving Solar Cell Efficiency (EU PVSEC 2010)
- HF-last Passivation for Heterojunction Solar Cells (UCPSS-2010)
- Single Wafer Back Side and Bevel Cleaning (UCPSS 2010)
- Surface Conditioning of Monocrystalline Silicon (EUPVSEC-2010)
- The Application of DIO3 Water on Wafer Surface Preparation
- Low Consumption Front End Of the Line Cleaning: LC-FEOL
- The Use of Ozonated HF Solutions for Polysilicon Stripping
- Evaluation of Advanced Pre-gate Cleanings
- HF Concentration Control in IC Manufacturing
- Using Ozonated-DI-water Technology for Photo Resist Removal
- Extending Reticle Life through Better Cleaning Budgets
- Goldfinger Megasonics Remove Chemically Amplified Photo Resist
with Low Cost Solvents - Effect of Pre-cleaning on Texturization of c-Si
- Insights into c-Si Processing for Photovoltaic Applications