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Batch-Immersion Systems


Akrion Systems has more than 1,400 wet station installations worldwide. Manufacturers use our systems to produce a wide variety of semiconductor products, including logic devices, analog devices, flash memory, DRAM and MEMS and to clean bare silicon and test wafers as well as photomasks.

The product line includes SCP's E200/9400 and AWP systems as well as GAMA,  i-clean and V3. I-clean uses in situ technology for a very small footprint (7 process steps in one tank). In situ processing ensures the use of fresh chemistry for every lot and reduces air interfaces for improved performance.

Sample process applications:

     Etching:

    Stripping:

     Cleaning:

  • Oxide
  • Nitride
  • Silicon Etch (MEMS)
  • Acid Resist Strip
  • Solvent Resist Strip
  • Pre-diffusion
  • Pre-Epi
  • Pre-photo
  • Photomask Clean
  • Wafer Reclaim

Click here for more information about our Batch-Immersion Products:

       GAMA and i-Clean               AWP/E200/9400             V3          Solar Products                     

 

 
 
 
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